Uniformity photoresist bake lamp

Sat, 27 Jun 2026 01:53:07 +0800

On the lithography floor, the soft bake and hard bake are where the photoresist profile gets made or broken. If the bake isn’t uniform across the wafer, you end up with thickness variation. That shows up later as CD excursions after etch, and the wafer becomes scrap. What matters under the hood We built the photoresist bake lamp around a short-wave NIR emitter array, paired with a carbon-fiber-reinforced quartz window. It holds wafer-level thermal uniformity to ±0.1°C, and temperature repeatability stays within ±0.5°C cycle-to-cycle. A 16-sensor array keeps the profile in closed-loop control, delivering a stable thermal budget that pulls solvent out of the resist without overshoot. The lamp runs 24/7 in Class 1–100 cleanrooms and generates zero particles, verified by in-line particle counts below 0.01/cm². Here is why that precision shows up on the line. Soft bake now drives solvent out consistently, and hard bake sets the resist without flow, so line width and sidewall angle stay where they should. Etch reflects the improvement immediately: fewer micro-loading effects, less rework, and predictable CD control across the wafer. Energy use drops, too, because the lamp hits setpoint in seconds and holds it with minimal drift, cutting idle thermal losses. Installation is straightforward, but you need a dedicated 24VDC power and a clean dry air supply to keep the window at its temperature setpoint. It fits most coat/bake tracks, but confirm tool-specific adapters for each platform. Plan the thermal budget for the entire bake stack. The lamp’s performance depends on the thermal mass of the chuck and the wafer stack-up.

Uniformity on Warm IR Halogen Heating

Uniformity photoresist bake lamp