Evatec evaporator heating lamp

Thu, 18 Jun 2026 01:31:05 +0800

On the fab floor, thermal drift quietly eats yield. A 0.5°C hotspot across the wafer during photoresist bake, or a lamp that lags during evaporation, turns a process that should be repeatable into a crapshoot. We built the Evatec evaporator heating lamp to pull that uncertainty off the table. What matters, technically The lamp uses a short-wave halogen emitter inside a quartz envelope, so you get rapid, direct radiant heat with sub-second response. Across the active area, wafer-level uniformity holds at ±0.1°C, and temperature repeatability stays tight from soft bake through hard bake. The design runs without spiking particle events, so cleanroom Class 1–100 counts stay where they need to be. It stays up 24/7 with no unplanned downtime, and output stays flat over 5,000+ hours—less than 5% drop. Why it works in practice Whether you’re drying wafers after cleaning, hitting photoresist with a controlled bake profile, curing encapsulants in packaging, or running the final rinse-and-dry, the thermal budget stays tight. Tight uniformity translates to fewer edge defects, less rework, and steady critical dimension control in lithography. The fast response trims cycle time, while stable output cuts scrap and stretches lamp life—fewer replacements and less energy per wafer. Here is what you need to know Installation means matching the tool’s connector interface and confirming the reflector geometry lines up with the chamber aperture. Output density is tuned to specific evaporation rates, so swapping lamps across different machines requires a quick recalibration of setpoint mapping. After changeover, plan a short burn-in and a thermal soak check to lock in the uniformity profile.

Evaporator on Warm IR Halogen Heating

Evatec evaporator heating lamp